A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.

根据平面区域变换的原理，导出电子束曝光机扫描场的畸变校正函数，并给出计算机模拟校正的结果。

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The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.

本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。

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The main parts include density adjustment, exposure adjustment, pre-printing adjustment and uniformity correction.

其主要环节包括密度校正、曝光量校正、均匀性校正、印前预校色等。

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The patent application also covers what could be controlled using the touchscreen, including settings like the focus detection area, flash adjustment, ISO, white balance, and exposure correction, to name a few -- all of which will surely be welcome to some, but we just hope the touchscreens will be accompanied by at least a few buttons and knobs for us old curmudgeons.

ENGADGET: Canon patent application points to touchscreen DSLRs

It incorporates functions such as a loupe, exposure picker, print, JPEG conversion, and batch white balance settings, highlight correction, noise reduction and aberration correction mode.

ENGADGET: Sigma DP3 Merrill packs a Foveon X3 sensor and a fixed F2.8, 75mm-equivalent lens