bi-exposal method 二次曝光法
Uniformity of the photoresist film, adhesiveness between underlay and glue film, exposal and develop condition of high thickness difference are all solved in the thesis. During the course of electro form process, we got ideal electro form process condition that can get windings with uniform granule and high compactness, including current waveform, frequency, duty ratio and voltage to the windings ect.
在厚胶光刻工艺中重点解决了胶膜厚度的均匀性、胶膜与衬底的粘附性、大厚度差胶层的曝光、显影条件等的优化问题。
参考来源 - 基于微机械工艺的电磁型平面微电机的研究·2,447,543篇论文数据，部分数据来源于NoteExpress
Short-arc mercury xenon lamp, single lamp, double-side exposal.
短弧汞氙灯，单灯，双面曝光。
Dynamic holographic interferometry measurement, which is twice exposal holographic interferometry, is realized through ruby double pulse laser.
采用红宝石双脉冲激光器，实现了动态全息干涉法测量，即两次曝光全息干涉法。
Uniformity of the photoresist film, adhesiveness between underlay and glue film, exposal and develop condition of high thickness difference are all solved in the thesis.
在厚胶光刻工艺中重点解决了胶膜厚度的均匀性、胶膜与衬底的粘附性、大厚度差胶层的曝光、显影条件等的优化问题。
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