etching process simulation 刻蚀工艺模拟
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Because of the combined of static and dynamic storage structure, the speed of the simulation is improved, so that the PC can carry out this etching simulation.
本系统利用硅晶胞的动态移动描述整个硅衬底腐蚀模拟的全过程，需要的存储空间小，提高了模拟计算的速度。
This paper introduces the computer simulation for the anisotropic etching used in micro-machining of sensors.
本文介绍传感器微机械加工中使用的各向异性腐蚀的计算机模拟。
The simulation results provide a theoretic guide for the fabrication of metallic nano-hole array by PS sphere's etching and vacuum depositing technology.
模拟结果为用PS球刻蚀技术制备金属纳米孔阵列的实验提供了理论支持。
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