photo-etching process 照相蚀刻技术
etching process chemical 蚀刻制程化学品
polyimide etching process 聚酰亚胺蚀刻工艺
powderless etching process 无粉腐蚀法
photolithography and etching process 光刻和腐蚀工艺
dry etching process 干法刻蚀 ; 干法蚀刻工艺
First the mechanism of plasma etching process was introduced, common modes and simulation method was introduced too.
首先讨论了刻蚀工艺的基本原理,分析了等离子体刻蚀过程中的各个参量与模型中参数对应关系。
参考来源 - 基于扩散限制刻蚀模型的等离子体刻蚀模拟研究·2,447,543篇论文数据，部分数据来源于NoteExpress
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