Corresponding to the etch mask used in conventional wet chemical etching, such as metal and silicon, the laminar flow was termed as "liquid etching mask". This method eliminates the need of expensive equipment or material.4.
与传统湿法腐蚀所使用的固态腐蚀掩模(如金属和硅)相比,命名这样的层流为“液态腐蚀掩模”。
参考来源 - 微流控芯片中层流现象的研究与应用·2,447,543篇论文数据，部分数据来源于NoteExpress
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Then, a micro exhaust duct was etched on an electroforming deposit through mask etching technology.
然后利用掩膜腐蚀方法在铸层上腐蚀出微排气通道。
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