A simple dynamic chemical etching device based on siphon principle is developed for fabrication of optical fiber probes which are commonly used in near-field optical microscopy.
基于虹吸原理,设计了一种动态化学腐蚀法的简易装置,用于制备近场光学显微镜光纤探针。
The device USES a deep etching with a shallow etching to shield the "static mirror" effect.
该器件采用一次深刻蚀与一次浅刻蚀,从而屏蔽掉“静态镜面”的影响。
After etching the surface of GaAs chip could be smooth and the isolation grooves have little edges, which can completely meet the requirements of device design.
腐蚀后芯片表面平整度、侧蚀等指标初步达到器件设计的要求。
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