• 刻蚀模型 - 引用次数：2

  With oxygen added, it is easy to obtain small blaze angles of 0.5-3°. The etch model based on rectangular mask is concise, and the etch process can be precisely controlled.

  O2有利于获得0.5-3°的小闪耀角,基于矩形掩模的刻蚀模型简单实用,工艺过程易于精确控制。

  参考来源 - 极紫外多层膜光栅的浮雕衬底制作及衍射效率测量与分析

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