Series of microcrystalline silicon thin films were fabricated by VHF-PECVD at different substrate temperatures (Ts).
采用VHF-PECVD技术制备了不同衬底温度的微晶硅薄膜样品。
The electrical and structural properties of microcrystalline silicon thin film and solar cells fabricated by VHF-PECVD were studied.
本文对VHF PECVD制备的本征微晶硅薄膜和电池进行了电学特性和结构特性方面的测试分析研究。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
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