The results show that the critical load of TiAlN film is up to 56 N, increased by 43% compared with the highest critical load before optimization.
优化后的涂层与基体的临界载荷达到56 N，比优化前最大临界载荷增加43%。
The results show that the target current has a great influence on the performance of TiAlN/TiN film. The surface of film becomes out-of-flatness by increasing target current.
结果表明： 靶材电流对膜层组织和硬度有显著影响，电流越高膜层表面越不平整，显微硬度随靶材电流的升高先上升后降低。
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