i thin film source i薄膜源
The first important thin film from the thermal oxide group is the gate oxide layer under which a conducting channel can be formed between the source and the drain.
第一个重要的来自热氧化组薄膜是栅氧化层,在它之下,源和漏之间就能形成导电通道。
In order to enhance the reliability and repeatability of the ferroelectric thin film preparation, the liquid source MOCVD system is designed based on PLC.
为了提高制备铁电薄膜的可靠性和重复性,设计了基于PLC控制的液态源MOCVD系统。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中,离子源是其中最关键的单元技术之一。
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