The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
The thickness uniformity of the films is one of the important factors affecting the application of deposition methods.
薄膜厚度的均匀性是影响沉积方法应用的一个重要因素。
We demonstrate that many layers particle films formed by random statistic rule under nucleation theory, the uniformity of its thickness is consistent with the fact.
论证了按成核理论下的随机统计规律生成的多层粒子膜，其厚度方面的不均匀性与实际是一致的。
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