2.2.1磁控溅射法镀膜: 溅射镀膜(sputtering deposition)是指用离子轰击靶材表面,使靶材的原子被轰击出来,溅射产生的原子沉积在基体表面形成薄膜。
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...sputtering deposition; amorphous phase; layer structure; solid solubility; Vegard law [gap=24604]关键词: Cu−W薄膜;溅射沉积;非晶相;层状结构;固溶度;Vegard规则 ...
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ion sputtering deposition 离子束溅射淀积
Dual-ion beam sputtering deposition 双离子束溅射淀积
dc sputtering deposition 直流溅射镀膜
co-sputtering deposition 共溅射沉积
The method can be used not only for vacuum evaporation deposition, but also for sputtering deposition to prepare the thin-film.
它 既能用于真空蒸发沉积,又可用于溅射沉积来制备薄膜。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中,离子源是其中最关键的单元技术之一。
The X-ray multilayer mirror for longer wavelength fabricated with ion-beam-sputtering deposition instrument OXFORD, is introduced in this paper.
叙述用离子束溅射镀膜机OXFORD进行X射线长波段多层膜实验及制备X射线多层膜光学元件方面的工作。
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