The physical effects of high dose ion implantation are discussed. The formation process of SIMOX materials and their various applications are described.
讨论了高剂量注入的物理效应，介绍了利用高剂量氧注入硅合成SIMOX材料的物理过程以及SIMOX技术的多种应用。
An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX.
采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备soi材料。
应用推荐