The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.
本发明涉及离子注入机imp，包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
Laser plasma soft X_ray source is a kind of pulsed light source. There are several diagnostic methods for this kind of light source.
激光等离子体软X射线光源是脉冲式光源，对这类光源的光谱诊断有几种方法。
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