In this paper a new pulsed high voltage power source is presented.
介绍了一种小型新颖的叠片式高压脉冲变压器。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
The pulsed power can works by high output voltage and large output current under the repetition rates, it has some merits: simple structure, high efficiency and high reliability.
这种脉冲电源可以实现在高重复频率工作下的高电压大电流输出，具有小型、高效和高可靠性。
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