The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
Based on the diffraction optical principle, a formula of the diffraction efficiency and etching depth error of the microlens is obtained.
基于衍射光学原理，获得了微透镜的衍射效率与蚀刻深度误差之间的关系式。
Base on this principle, a three-beam holography system is set up. The diffraction efficiency and the quality of the diffraction image are shown to be greatly improved by the auxiliary violet light.
根据此原理，建立了三光束全息光存储系统，在红光记录全息图的同时加入辅助紫光，可以使全息图衍射效率及衍射像的像质得到提高。
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