The parameters of the optical slab glass waveguide (refractive index and thickness of thin film) were measured by a new technique for using the prism coupler, i. e., leaky mode method.
由使用棱镜耦合器的一种新技术即漏模法,测量了平板玻璃光波导的参数(薄膜的折射率和厚度)。
Through the selection of processing parameters and surface modification. The distribution of thin film stress is possible changed and thin film property is improved.
通过选择适当的工艺条件以及表面处理可以改变薄膜的应力分布,提高薄膜的性能。
Lots of experiments indicate that the form, structure and properties of silicon nitride thin film prepared by PECVD are related to deposition parameters.
大量的实验研究表明,PECVD氮化硅薄膜的组成、结构及其性能与沉积参数密切相关。
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