The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.
综述了二元光学元件的常用制作工艺技术，包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。
In order to meet the requirements of optical, electronic and mechanical performance of semiconductor products, it is necessary to measure thin film stress during the deposition.
为使半导体产品达到所要求的光学、电子和机械性能，必须实时地在沉积过程中直接测量薄膜应力。
Because the capacity of the optical component lies crucially on the thin film thickness, monitoring the deposition thickness becomes the key to the precise production.
光学薄膜的厚度对光学元件的性能有决定性的影响，因此精确控制膜厚就成为了关键。
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