Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.

纳米压印光刻技术具有效率高、失真率低、易于实现大面积图形转移等特点，成为下一代光刻技术的研究热点。

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Inside those arenas the key to building the next generation of tiny chips is a technique known as immersion lithography.

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