Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

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Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

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