The evolution rule of the rare earth aluminum capacitor foil preparation process was investigated by means of bit etching, EBSD micro orientation analysis and X-ray method.

采用蚀坑法、EBSD微取向分析和X射线法等手段，对稀土电解电容器用铝箔制备过程中的织构演变规律进行了研究。

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Using IC-compatible silicon as substrate and MEMS processing technology, it is fabricated with silicon wet etching and SU8 micro reaction pool.

以与IC兼容的硅作为基底材料，利用MEMS加工工艺，采用硅腐蚀及SU8微反应池方法制成了新型微电极传感器。

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In view oi the problems existing in the silicon micro pressure sensors, this paper proposes the chemical etching techniques and the selective etching processes to control diaphragm thickness.

并针对硅微压传感元件研制中存在的问题，提出采用化学腐蚀技术，选择性腐蚀工艺控制膜厚。

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