英国拉夫堡大学的 Yahya 等 [18] 用量纲分析的方法研究了放电参数对液中电 火花加工的材料去除率（Material Remove Ratio，MRR）的影响，建立了材料去 除率的数学模型，并对其进行了验证。
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Currently, the slurries used in CMP usually contain particles at nano scale to accelerate the material remove ratio (MRR) and to optimize the planarity.
目前，CMP的抛光液通常使用纳米级颗粒来加速切除和优化抛光质量。
Experimental results show that the material remove rate(MRR) increases with the increase of laminated depth and decreases with the increase of tool path overlap ratio.
研究结果表明工件的加工速度随着分层厚度的增加而增加，随着轨迹重叠率的增加而减小；
In this study, we try to use the high aspect ratio LDH material synthesised in our lab as a composite of commercial titanium dioxide (P-25), and apply it to remove of 2-nitrophenol pollution.
本研究尝试采用自制的高长径比的LDH材料与商品粉体二氧化钛(P - 25)复合，并对邻硝基苯酚进行去除试验。
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