material remove rate 材料去除率
material remove model 材料去除模型
Material Remove Ratio 的材料去除率
material remove mechanism 材料去除机理
Remove Material 移除材料 ; 去除材料
Remove Lofted Material 移去放样部分
Remove Material Override 移除材质覆盖
As the material remove rate of polishing and other technology is very little, so measuring the material remove rate is too difficult.
抛光加工工艺的材料去除量非常微小,因此难以对该材料去除量进行精确测量。
The laws of material remove rate with tool electrode ultrasonic vibration assisted are less than that with workpiece ultrasonic vibration assisted.
实验结果表明:工具电极做超声振动时的材料去除率比工件做超声振动时的材料去除率要小;
Currently, the slurries used in CMP usually contain particles at nano scale to accelerate the material remove ratio (MRR) and to optimize the planarity.
目前,CMP的抛光液通常使用纳米级颗粒来加速切除和优化抛光质量。
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