Low voltage high current reactive ion plating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
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