ion sputtering coator 离子溅射镀膜台
ion sputtering pump 离子溅射泵
Ion sputtering technology 离子溅射技术
argon ion sputtering cleaning 氩离子溅射净化
ion-sputtering 离子束溅射
ion sputtering deposition 离子束溅射淀积
ion sputtering coater 离子溅射镀膜台
ar ion sputtering ar离子溅射
So it is necessary to conduct an in-depth study. The focus of this paper is to research the microcosmic physical mechanisms of solid surface ion sputtering.
但受研究手段的限制,载能离子溅射沉积薄膜生长机制一直缺乏比较全面、系统的了解,因此有必要进行深入的研究,本文所要研究的重点是载能离子在固体表面溅射微观物理机理。
参考来源 - 载能离子对固体材料表面溅射的模拟研究·2,447,543篇论文数据，部分数据来源于NoteExpress
Ion sputtering yields on t? Ti target are numerically calculated with TRIM program.
应用TRIM程序模拟了离子在氚钛靶上的溅射产额。
However, the predominant process of secondary ion sputtering is kinetic sputtering, which closely related to the momentum deposition on the target surface (nuclear stopping power).
而主导二次离子溅射的过程是动能溅射，它与靶表面的动量沉积(核能损)过程密切相关。
The electronic circuitry of the various vacuum protection schemes, which use sputtering ion pump or cold-cathode or hot cathode ionization gauge as sensors, was compared.
分析比较了溅射离子泵、冷阴极电离超高真空计、热阴极电离超高真空计等作为真空保护传感器的不同电子学设计。
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