The first plate electrode is formed on a second inner connection structure provided under the dielectric etch stop layer.
该第一平板电极形成于设于该介电蚀刻停止层下的一第二内连接结构之上。
This phenomenon may be related to structure and function of inner ear damaged during electrode implantation process and widespread inflammation after the cochlear implantation.
此现象可能与电极植入过程中损害内耳结构和功能，以及术后耳蜗内广泛炎症等有一定关系。
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