The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
This paper introduces a high-frequency series resonant charing method of solid pulsed laser power source, basing on constant current charging of digital control technology.
介绍了一种高频串联谐振充电的固体脉冲激光电源及其数字化控制恒流充电技术。
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