high-energy silicon ion-beam 高能硅离子射线
However, the high energy ion beam may result in a large absorption of film materials and thus makes the technique useless.
然而，高能离子束诱发薄膜材料相当大的吸收，导致该技术几乎无法使用。
Surface modification of materials by means of high-energy laser beam, electron beam and ion beam technology are realized through changing composition and structure of the material surface.
激光束、电子束、离子束三种高能束流技术对材料表面改性是通过改变材料表面的成分或结构实现的。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
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