... high-rate aerobic treatment ==> 高负荷需氧处理法 high-rate cathode ==> 高倍率阴极 high-rate digestion ==> 高负荷消化法 ...
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Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
The results show that small particle size, good connectivity among particles and high porosity of the cathode enhance the rate of electro-deoxidation.
结果表明：微孔阴极中的颗粒连通性好、颗粒尺寸小以及孔隙率高都有利于电脱氧的进行。
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