Some experimental studies and analysis were carried out on the glow discharge characteristics of the developed equipment, and the prevention and control measures were proposed subsequently.
对研制设备的低压放电特性进行了试验研究和分析，并针对性提出低压放电防控措施。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
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