The experiment shows that the gas ion source provides obvious pulverization for metal particles.
实验结果表明：气体离子源具有明显的细化金属颗粒的作用。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use.
TITAN离子源是一种新的能够同时产生强金属和气体离子束流的离子源。
应用推荐