To deeply investigate doping technology and implement it, this dissertation will focus on the research of gas doping process.
为了深入的研究并应用该项技术,本文对汽相掺杂工艺进行了研究和探讨。
参考来源 - 硅单晶汽相掺杂技术的研究·2,447,543篇论文数据，部分数据来源于NoteExpress
Phosphine (PH3) is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping, ion implement and chemical vapor deposition (CVD) etc.
磷化氢(PH3)是一种重要的电子特气，主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
A colorless, spontaneously flammable poisonous gas, PH3, having a fishy odor and used as a doping agent for solid-state components.
磷化氢，三氢化磷一种无色的、易自燃的有毒气体，ph3，有象鱼的气味，可用作。
Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积(PECVD)技术，不使用掺杂，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
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