...devices fabrication flow) 矽基板清洁 (Wafer clean) 薄膜沉积与曝光 (Film deposition and Lithography) 薄膜蚀刻 (Film etch) 离子布植与氧化 (Ion implantation and Oxidation) *薄膜蚀刻 (Film etch) *离子布植 (Ion implantation) *薄膜沉积与蚀刻 (Fil...
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The results showed that plasma treatment would etch film surface, which would affect the roughness of film surface and the density of grafted ammonia group.
结果表明，氨等离子处理会对膜表面产生一定的刻蚀作用，从而影响膜表面的粗糙度及氨基接枝密度；
The uniform sol gel derived silicon dioxide film was prepared under optimal conditions. DFVP was applied to etch this film. The photolithography patterns was obtained due to the different etch…
并将无显影气相光刻的方法应用于这种二氧化硅膜的刻蚀，通过优化后的光刻工艺参数得到了反差明显的光刻图形。
In order to improve the uniformity of the thin film of silicon, the interface of hetero-junction of SOI material was used as the interface of etch self-stopping.
为了提高电容式触觉传感阵列的性能，本工作以SOI材料中异质结界面作为深槽腐蚀中腐蚀自停止界面，以提高硅膜片的表面平整度和厚度均匀性。
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