The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.
采用离子束溅射方法制备了正巨磁电阻多层膜,在制备过程中采用外加磁场和退火处理。
A windowed very small aperture laser (VSAL) source for use in high resolution near field optical data storage is fabricated.
报道了一种窗口型的用于高分辨率近场光学存储领域的极小孔激光器。
应用推荐