In this paper, a new scheme of vector quantization is described to reduce the effect of error propagation.
为了降低误差积累的影响，本文提出了一种新型的矢量量化方法。
To give an error analysis of this effect, the propagation of partial coherent light in the proximity UV-lithography was investigated and the relative theoretical model was proposed.
为此，研究了接近式紫外光刻中部分相干光的传播过程，建立了相应的光刻理论模型，对光刻成像中的误差产生机理进行分析。
Using the improved error backward propagation, the model is trained with stylebook data and validated its effect by other stylebook data.
利用误差反向传播的改进算法对样本数据进行训练，并用另外的一些样本数据验证模型的应用效果。
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