The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
This may be due to one more volatile substance as internal standard resulting in the rapid uniform distribution of samples partial pressure in the injection chamber.
这可能是由于双内标可使样品分压在进样室快速均匀分布所致。
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