The lithography technique to fabricate the curved microlens array on the curved substrate by using laser direct writing system was also given.
文中给出了用激光直写设备在曲面基底上进行光刻来制作曲面微透镜阵列的方法。
In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy.
在二元光学元件激光直写设备中，主轴速度调节效果的好坏是决定刻划效率与精度的关键因素之一。
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