critical deposition potential 临界淀积电位
sweep potential deposition 扫描电位沉积法
Thickness and structure of films can be precisely controlled by electrochemical parameters on conductive substrate of complex shapes,such as deposition potential,current density and solution composition. Moreover,electrodeposition is an economical deposition method due to simple process and inexpensive equipment.
电沉积通常在室温条件下操作,沉积的量由Faraday定律控制,并可通过改变沉积电位、电流密度、溶液组成等控制膜的厚度及结构:此外,电沉积技术工艺简单、价格低廉,是一种经济的沉积方法。
参考来源 - 氢氧化镁、氧化锌微/纳米结构的软化学合成与表征·2,447,543篇论文数据,部分数据来源于NoteExpress
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