DC are plasma jet CVD 直流电弧等离子体CVD
dc arc plasma cvd 直流电弧等离子体cvd
dc plasma enhanced cvd 直流pcvd
DC arc discharge plasma CVD 直流弧光放电PCVD法
The internal stress in diamond thin films deposited by DC plasma CVD was studied as a function of methane concentration and deposited temperature.
研究了直流等离子体化学汽相沉积（CVD）法合成的金刚石膜内应力随甲烷浓度、沉积温度的变化关系。
Diamond film wafers with different thickness were prepared by high power DC arc plasma jet CVD method.
采用高功率直流电弧等离子体cvd工艺制备了不同厚度的无裂纹自支撑金刚石厚膜。
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