chemical vapor deposition method 化学气相淀积工艺 ; 化学气相沉积法 ; 化学蒸气沉淀法 ; 化学蒸汽沉积法
chemical vapor transport method 化学气相输运法
catalytic chemical vapor deposition method 催化化学蒸汽沉积法
chemical vapor deposition method pcvd 化学蒸汽沉积法
chemical vapor decomposition method 化学气相沉积法
plasma chemical vapor deposition method 等离子体化学气相沉积法
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
MOCVD is an abbreviation form for Metal Organic Chemical Vapor Deposition, which is a method used to grow material crystal on substrate via MOCVD device.
MOCVD是金属有机物化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
应用推荐