The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
The cathode electric arc source is used as the source of ion infiltrating metals.
本文用阴极电弧源做离子渗金属源。
A multi-cathode metal vapor vacuum arc (WEVVA) ion source has been designed. It contains an array of 18 cathodes, any of which can be switched into operation rapidly while under vacuum.
设计了一台多阴极的金属蒸气真空弧离子源，它有18个阴极，任一阴极都能在真空状态下被迅速接入电路工作。
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