The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.

等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。

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Results and Conclusion the experimental results indicate that the output pulsed high voltage of the generator can meet the demand of the cold cathode X-tube.

结果与结论实验表明该发生器的输出脉冲高压能满足冷阴极射线管的要求。

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An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.

本文介绍了一种中频交流脉冲式磁控溅射靶极电源。

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