Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
The robust optimization based on the product quality engineering can improve the reliability and robustness of the optimization result for the crashworthiness of the frontal longitudinal beam.
基于产品质量工程的稳健性优化设计方法能够有效提高前纵梁结构优化结果的可靠性和稳健性。
Optimization of the magnetic focusing system can decrease the radial magnetic induction and improve the electron beam quality.
通过对磁聚焦系统进行优化设计，外层电子注轨迹得到明显改善。
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