Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
According to the theory of uncertainty, optimization on the highly accuracy equal strength beam for calibration has been investigated. The optimum design method and parameters have been determined.
基于现代不确定度理论，探讨了高精度等强度标定梁的优化，确定了最佳设计方法和设计参数。
By applying the numerical simulation technology, it makes the optimization process for light beam heating parameters more efficient and economic.
采用数值模拟技术，可以使聚焦光束处理参数的优化过程更加经济、高效。
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