采用弧过滤离子沉积系统(arc filtered deposition,AFD)在纯硅表面制备铁纳米薄膜。研究了750℃下铁纳米薄膜在氢气氛围以及氨气氛围中重凝核的规律。
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Filtered Arc Deposition 真空磁过滤弧沉积
filtered cathode vacuum arc deposition 过滤阴极真空电弧离子镀膜技术
filtered arc deposition fad 真空磁过滤弧沉积
filtered arc plasma deposition 电弧离子镀
filtered vacuum arc deposition 过滤式电弧沉积
filtered cathode arc deposition 过滤式阴极电弧沉积
filtered vacuum arc plasma deposition 过滤阴极真空弧沉积
filtered arc cathodic plasma deposition 磁过滤等离子体沉积
magnetically filtered vacuum arc deposition 磁过滤阴极真空弧沉积
Diamond -like -carbon (DLC) thin film was prepared by filtered arc deposition (FAD) with a good electron emission performance.
采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能。
The instrument of filtered cathode arc deposition is successfully built in our laboratory. Diamond-like carbon film is maded.
研制了一套过滤式阴极电弧沉积设备，并利用该设备成功地获得了类金刚石薄膜。
It is possible to deposit DLC (Diamond-Like Carbon) without MP by filtered vacuum arc deposition.
采用过滤阴极电弧沉积方法有可能制成无宏观粒子的类金刚石薄膜。
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