and step 3, performing planarization etching and forming a layer of the insulator thin film on the side wall of the contact window.
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But because we've used the same resource to do Step 2a, Step 2b, and Step 3, we need to add an additional two days.
但由于我们使用了同样的资源进行步骤2a、2b和3,我们需要额外增加两天时间。
And step 3 doesn't exist for these types of actions because for these actions, the attribute execute is set to false.
对于这种动作,不存在第3步,因为它们的execute属性设置为false。
If you already have an existing DB2 database, skip this step and proceed directly to step 3 to start configuring your database connection.
如果已经有一个DB 2数据库,那么可以忽略这一步,直接进入步骤3,开始配置数据库连接。
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