... 铑(白金)电镀工艺rhodium plating process 硫酸铜电镀acid copper solution 铝及铝合金前处理chemistry for plating on Al&Al alloy ...
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Using a mixed solution of thiosemicarbazide and ascorbic acid as reducing agent, arsenic is reduced and separated from precipitated copper.
本法使用硫代氨基脲-抗坏血酸作为还原剂，将砷还原同时将铜沉淀分离。
This technology USES a new catalyst to make copper oxidized by air in a dilute sulfuric acid solution and thus to prepare industrial cupric sulfate.
该工艺是使用一种新型铜蚀助剂，使紫铜在稀硫酸溶液中迅速被空气氧化而制备工业硫酸铜。
A new method has been studied for the determination of trace phosphorus in iron, nickel and copper by floatation-extraction spectrophotometry with molybdate and malachite green in acid solution.
研究了在酸性介质中，钼酸盐孔雀绿浮选分光光度法测定铁、镍、铜中痕量磷。
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