Kim said, "We will be able to use a low-temperature polycrystal silicon with the sixth-generation size glass substrate."
Kim称：“我们现在已经可以在6G尺寸级别的基板上应用低温多晶硅技术。
Conventional CVD coating process requires a metal compound that will volatilize at a fairly low temperature and decompose to a metal when it contacts with the substrate at higher temperature.
常规的化学蒸发沉淀涂层工艺需要一种容易在相当低温度下挥发并且在较高温度下与基体接触时能分解成纯金属的金属化合物。
In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films.
在热丝化学气相沉积金刚石系统中，衬底温度是影响金刚石成膜质量的关键因素之一。
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