纯度很高、 所含杂质常以百万分之几计算的金属。由于它们的性能与一般工业纯金属显著不同，因而获得了特殊用途。例如制备半导体材料用的锗、铟、镓等金属要 求达到99.999%以上的纯度。高纯金属还大量用于科研领域。纯度要求更高的金属 (其中杂质含量甚至降至十亿分之一以下) 称为 “超纯金属”。
本文对高纯金属铽的制备进行了研究。
本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
In this paper, several thin films samples of vanadium oxide were got by high-frequency Magnetron sputter with pure metal vanadium as sputter source.
然后给出了用真空蒸馏法制备高纯金属钪的新工艺，并对其提纯机制作了探讨。
Then the new technology in preparation of high purity scandium metal was proposed and its purification mechanism was discussed.
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