因而是对量子光刻术的一个很大改进。

All these make a great improvement to quantum lithography.

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因此，在实际应用中，它可以提供具有合适可见度的强光量子光刻术。

It may provide a strong quantum lithography with a moderate visibility in p.

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弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。

It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography.

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